GSM327059 |
WT strain treated with 0.5mM H2O2 at 10min time point and WT strain with no treatment (1st repeat) |
GSM327060 |
WT strain treated with 0.5mM H2O2 at 10min time point and WT strain with no treatment (2nd repeat) |
GSM327061 |
WT strain treated with 0.5mM H2O2 at 10min time point and WT strain with no treatment (3rd repeat) |
GSM327062 |
WT strain treated with 0.5mM H2O2 at 30min time point and WT strain with no treatment (1st repeat) |
GSM327063 |
WT strain treated with 0.5mM H2O2 at 30min time point and WT strain with no treatment (2nd repeat) |
GSM327064 |
WT strain treated with 0.5mM H2O2 at 30min time point and WT strain with no treatment (3rd repeat) |
GSM327065 |
WT strain treated with 0.5mM H2O2 at 60min time point and WT strain with no treatment (1st repeat) |
GSM327066 |
WT strain treated with 0.5mM H2O2 at 60min time point and WT strain with no treatment (2nd repeat) |
GSM327067 |
WT strain treated with 0.5mM H2O2 at 120min time point and WT strain with no treatment (1st repeat) |
GSM327068 |
WT strain treated with 0.5mM H2O2 at 120min time point and WT strain with no treatment (2nd repeat) |
GSM327069 |
WT strain treated with 0.5mM H2O2 at 120min time point and WT strain with no treatment (3rd repeat) |
GSM327070 |
WT strain treated with 0.5mM H2O2 at 60min time point and WT strain with no treatment (3rd repeat) |
GSM327071 |
Atf1 deletion strain treated with 0.5mM H2O2 at zero time point (1st repeat) |
GSM327072 |
Atf1 deletion strain treated with 0.5mM H2O2 at zero time point (2nd repeat) |
GSM327073 |
Atf1 deletion strain treated with 0.5mM H2O2 at zero time point (3rd repeat) |
GSM327074 |
Atf1 deletion strain treated with 0.5mM H2O2 at 10min time point (1st repeat) |
GSM327075 |
Atf1 deletion strain treated with 0.5mM H2O2 at 10min time point (2nd repeat) |
GSM327076 |
Atf1 deletion strain treated with 0.5mM H2O2 at 10min time point (3rd repeat) |
GSM327077 |
Atf1 deletion strain treated with 0.5mM H2O2 at 30min time point (1st repeat) |
GSM327078 |
Atf1 deletion strain treated with 0.5mM H2O2 at 30min time point (2nd repeat) |
GSM327079 |
Atf1 deletion strain treated with 0.5mM H2O2 at 30min time point (3rd repeat) |
GSM327080 |
Atf1 deletion strain treated with 0.5mM H2O2 at 60min time point (1st repeat) |
GSM327081 |
Atf1 deletion strain treated with 0.5mM H2O2 at 60min time point (2nd repeat) |
GSM327082 |
Atf1 deletion strain treated with 0.5mM H2O2 at 60min time point (3rd repeat) |
GSM327083 |
Atf1 deletion strain treated with 0.5mM H2O2 at 120min time point (1st repeat) |
GSM327084 |
Atf1 deletion strain treated with 0.5mM H2O2 at 120min time point (2nd repeat) |
GSM327085 |
Atf1 deletion strain treated with 0.5mM H2O2 at 120min time point (3rd repeat) |
GSM327086 |
Pcr1 deletion strain treated with 0.5mM H2O2 at zero time point (1st repeat) |
GSM327087 |
Pcr1 deletion strain treated with 0.5mM H2O2 at zero time point (2nd repeat) |
GSM327088 |
Pcr1 deletion strain treated with 0.5mM H2O2 at zero time point (3rd repeat) |
GSM327089 |
Pcr1 deletion strain treated with 0.5mM H2O2 at 10min time point (1st repeat) |
GSM327090 |
Pcr1 deletion strain treated with 0.5mM H2O2 at 10min time point (2nd repeat) |
GSM327091 |
Pcr1 deletion strain treated with 0.5mM H2O2 at 10min time point (3rd repeat) |
GSM327092 |
Pcr1 deletion strain treated with 0.5mM H2O2 at 30min time point (1st repeat) |
GSM327093 |
Pcr1 deletion strain treated with 0.5mM H2O2 at 30min time point (2nd repeat) |
GSM327094 |
Pcr1 deletion strain treated with 0.5mM H2O2 at 30min time point (3rd repeat) |
GSM327095 |
Pcr1 deletion strain treated with 0.5mM H2O2 at 60min time point (1st repeat) |
GSM327096 |
Pcr1 deletion strain treated with 0.5mM H2O2 at 60min time point (2nd repeat) |
GSM327097 |
Pcr1 deletion strain treated with 0.5mM H2O2 at 60min time point (3rd repeat) |
GSM327098 |
Pcr1 deletion strain treated with 0.5mM H2O2 at 120min time point (1st repeat) |
GSM327099 |
Pcr1 deletion strain treated with 0.5mM H2O2 at 120min time point (2nd repeat) |
GSM327100 |
Pcr1 deletion strain treated with 0.5mM H2O2 at 120min time point (3rd repeat) |
GSM327170 |
SP Atf1-HA ChIP-chip sample |
GSM327171 |
SP Atf1-HA (treated with 0.5 mM H2O2 for 30min) ChIP-chip sample |
GSM327172 |
SP Pcr1-HA ChIP-chip sample |
GSM327173 |
SP Pcr1-HA (treated with 0.5mM H2O2 for 30min) ChIP-chip sample |
GSM327174 |
SP Sty1-HA ChIP-chip sample |
GSM327175 |
SP Sty1-HA (treated with 0.5 mM H2O2 for 30min) ChIP-chip sample |
GSM327176 |
SP Atf1 deletion Sty1-HA (treated with 0.5 mM H2O2 for 30min) ChIP-chip sample |
GSM327177 |
SP Pcr1 deletion Sty1-HA (treated with 0.5 mM H2O2 for 30min) ChIP-chip sample |