|
| Status |
Public on Jul 01, 2013 |
| Title |
Exponential 2M NaCl, biological rep 1 |
| Sample type |
RNA |
| |
|
| Source name |
Staphylococcus aureus late exponential
|
| Organism |
Staphylococcus aureus subsp. aureus USA300 |
| Characteristics |
genotype: Wildtype
protocol: 2M_NaCl
growth phase: Late exponential
|
| Treatment protocol |
Once reaching late exponential phase (Optical Density 600nm of 0.7) 1:1 acetone-ethanol was added to inhibit cellular ribonucleases
|
| Growth protocol |
Cells were grown to late exponential phase in LB0 broth supplemented with 0 or 2 M NaCl at 37C with aeration (225 rpm in a rotary shaker)
|
| Extracted molecule |
total RNA |
| Extraction protocol |
Total bacterial RNA was isolated using Rneasy kits according to the manufacturer's recommendations (Qiagen)
|
| Label |
Biotin
|
| Label protocol |
cDNA was synthesized, fragmented and biotinylated according to the manufacturer's protocol for prokaryotic antisense labeling (Affymetrix)
|
| |
|
| Hybridization protocol |
1.5 ug of cDNA were hybrized for 16 hr at 45C on a S. aureus Affymetrix GeneChip. GeneChips were washed and stained in an Affymetrix Fluidics Station using ProKaryotic GE-wash2 protocol.
|
| Scan protocol |
GeneChips were scanned in an Affymetrix 7G GeneArray Scanner
|
| Description |
Gene expression data from late exponential phase wildtype USA300-lac cells grown in 2M NaCl
|
| Data processing |
The data were analyzed with Microarray Suite version 5.0 using Affymetrix default analysis settings.
|
| |
|
| Submission date |
Apr 25, 2013 |
| Last update date |
Jul 01, 2013 |
| Contact name |
Paul Dunman |
| E-mail(s) |
paul_dunman@urmc.rochester.edu
|
| Phone |
585-276-5700
|
| Organization name |
University of Rochester
|
| Department |
Microbiology and Immunology
|
| Street address |
601 Elmwood Avenue
|
| City |
Rochester |
| State/province |
NY |
| ZIP/Postal code |
14642 |
| Country |
USA |
| |
|
| Platform ID |
GPL1339 |
| Series (1) |
| GSE46383 |
Expression from Staphylococcus aureus strain USA300-lac during low and 2M NaCl exposure |
|
